精密電鑄應用於微圖化耐高溫彩色濾光片製程開發

Abstract

摘 要 由於科技日新月異，輕、薄、短、小、精已成為產品主流趨勢，光電系統中的光學薄膜微圖化製程技術的需求也日益增加。在目前的顯示技術中，彩色濾光片微圖化製程，都是使用印刷、染料或顏料的塗佈技術，不過此技術的最大缺點是染料或顏料的耐熱度較低，工作時不能承受太高的溫度，這對使用高流明的顯示技術將是一大問題。且染料或顏料是以吸收可見光不同波段的方式來呈現色彩，這將會損耗較多的能源或需要更高流明的燈泡。再加上染料或顏料的色彩已固定，如果設計不同的顯示顏色需求，將必須重配染料或顏料的成份組成，這是一件很困難的工作。因此本研究鑒於這些缺點，將結合「黃光微影」、「精密電鑄」與「電子槍蒸鍍」技術，用以製作一微圖化可耐高溫的彩色濾光片，其具有高光穿透性、高解析度、色度純、化學穩定度高以及可耐高溫的彩色濾光片。這樣的製作方式與IC製程的相容性高，可以迅速地被加入相關產業應用，並用於投影機、光學偵測器或生醫檢測方面以及其他光學的應用。 實驗的結果證實以金屬取代厚膜光阻，當作薄膜製鍍時的金屬遮罩，用以定義光學薄膜的微圖案。並完成製鍍直條紋與馬賽克圖案排列，線徑寬度為20 m的R與B波段濾光片，以及量測薄膜的光穿透率，其平均穿透率 達90 %以上。証實了本研究所開發的製程，可成功製作微圖化的光學介質膜。

關鍵詞：彩色濾光片、黃光微影、精密電鑄、電子槍蒸鍍、光學偵測器Abstract There is an increasing need on fabricating optic films with micro-pattern for optoelectronic devices. Dispersion methods, such as dyeing, pigment and printing, are currently used in preparing color filters for display technology. However, bad thermal stability of manufacturing coating materials is a great challenge for high-luminant displays. In this study, we used photolithography to define the growth of Ni films by electroforming. The Ni films can be used to replace photoresistas mask to selectively deposit optical films by E-gun evaporation. Straight and mosaic patterns are chosen as arrangements of R, B and G color films. The average light transmittances of the color films are larger than 90 %. The experimental results show that the process can be used to fabricate optical films with desired micro-patterning. We have successfully demonstrated the use of photolithography, electroforming and E-gun evaporation technologies to fabricate chemically and thermally stable micro-patterned optical films with high light transmittance, resolution and color purity. Because of good compatibility with IC manufacturing process, our method can be quickly adapted in applications of projector, optical sensor and bio-inspection. Keywords：color filter, photolithography, electroforming, E-gun evaporation, optical sensor